ProductsSubstrate ETCHing And Photoresist Stripping SystemsWafer, Photomask,
& Substrate
Cleaning SystemsManual Cleaning
SystemsAutomated Cleaning
SystemsWet Bench / Batch
Cleaning Systems / Alcohol Vapor DryerReionizers & Mixing
SystemsCovered Chuck Spin
CoatersPhotoresist
Developer StationsETCH AND STRIP SYSTEM

Ultra t Equipment Company, Inc. Specializes in Fully Automated and
Semi-Automated Ultra Precision Clean, Coat, Develop, Etch and Photoresist Strip Systems for the Semiconductor, Mobile, Solar, MEMS, Fiber Optics, Wearables and Other Industries

Positive & Negative Photoresist Strip Systems Positive & Negative
Photoresist Strip Systems		   Chemical Etch Systems
      Chemical Etch Systems
Wafer, Photomask, and Substrate Cleaning SystemsWafer, Photomask,
and Substrate Cleaning Systems		   Reionizers and Mixing SystemsReionizers and Mixing Systems
Covered Chuck Spin CoatersCovered Chuck Spin Coaters   Photoresist Developer StationsPhotoresist Developer Stations
Ultra t Equipment Company has been supplying reliable clean, coat, develop, etch and photoresist strip equipment to the international Microelectronic Industry for over 20 years. The equipment covers a wide range of process applications from Cleaning, Coating, Developing, Chemical Etching and Photoresist Stripping.
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